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A META-ANALYSIS OF LASER LIGHT SCATTERING TECHNIQUES FOR THE CHARACTERIZATION OF SEMICONDUCTOR MATERIALS

Area: Department of Physics
Abstract: Laser light scattering techniques have emerged as indispensable analytical tools for characterizing semiconductor materials, providing non-destructive and high-resolution measurements of structural, optical, and electronic properties. This meta-analysis synthesizes research conducted over the past two decades to evaluate the efficacy, applicability, and limitations of various laser light scattering methodologies including Raman spectroscopy, Brillouin scattering, dynamic light scattering (DLS), and resonant light scattering (RLS). Through systematic review of 180+ peer-reviewed articles and technical reports, this study identifies key advancements in laser scattering technologies, compares quantitative performance metrics across different techniques, and establishes frameworks for optimal technique selection based on specific material characterization requirements. Critical analysis reveals that Raman spectroscopy maintains predominance with 67% citation frequency, while emerging hybrid approaches combining multiple scattering modalities demonstrate superior diagnostic capabilities. This meta-analysis contributes to the standardization of laser scattering protocols for semiconductor analysis, identifies research gaps particularly in real-time in-situ characterization during device fabrication, and proposes future research directions including integration with machine learning algorithms for automated spectral interpretation. The comprehensive synthesis provides researchers and practitioners with evidence-based guidance for selecting, implementing, and interpreting laser light scattering techniques in semiconductor materials research and quality control applications.
Author: Riya Dhadhich¹, Dr. Bhanu Pratap²
DOI: MJAP/05/1507
Page: 77-86
Paper Id: 1507
Publication Date: 26-Jul-2026
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